Sample position controller in focused ion beam system

Radiant energy – Means to align or position an object relative to a source or...

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250309, G01N 2300

Patent

active

054344220

ABSTRACT:
Disclosed is a sample position controller in a focused ion beam system in which a reference unit quantity on a surface of a sample having a structure in which a pattern is repeated at regular intervals is calculated on the basis of the quantity of movement of the sample to which a focused ion beam is radiated and a cyclic detection signal outputted from a charged particle detector with the sample movement as changing correspondingly to the change of the arrangement structure of the surface of the sample, so that the sample position is set on the basis of the reference unit quantity while controlling the moving operation of a sample moving mechanism by using the reference point set on the sample and the reference unit quantity calculated.

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patent: 5136169 (1992-08-01), Smith et al.
patent: 5168166 (1992-12-01), Hayakawa et al.

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