Sample inspection system

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C356S237500

Reexamination Certificate

active

06891611

ABSTRACT:
A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.

REFERENCES:
patent: 4395126 (1983-07-01), Kramer
patent: 4449818 (1984-05-01), Yamaguchi et al.
patent: 4540286 (1985-09-01), Satake et al.
patent: 4558949 (1985-12-01), Uchara et al.
patent: 4589773 (1986-05-01), Ido et al.
patent: 4598997 (1986-07-01), Steigmeier et al.
patent: 4669875 (1987-06-01), Shiba et al.
patent: 4740079 (1988-04-01), Koizumi et al.
patent: 4794265 (1988-12-01), Quackenbos et al.
patent: 4861164 (1989-08-01), West
patent: 4893032 (1990-01-01), Braden
patent: 4893932 (1990-01-01), Knollenberg
patent: 4898471 (1990-02-01), Vaught et al.
patent: 4929845 (1990-05-01), Amir et al.
patent: 4966457 (1990-10-01), Hayano et al.
patent: 5058982 (1991-10-01), Katzir
patent: RE33956 (1992-06-01), Line et al.
patent: 5125741 (1992-06-01), Okada et al.
patent: 5155372 (1992-10-01), Bowen et al.
patent: 5189481 (1993-02-01), Jann et al.
patent: 5245403 (1993-09-01), Kato et al.
patent: 5389794 (1995-02-01), Allen et al.
patent: 5416594 (1995-05-01), Gross et al.
patent: 5424838 (1995-06-01), Siu
patent: 5463459 (1995-10-01), Morioka et al.
patent: 5465145 (1995-11-01), Nakashige et al.
patent: 5486919 (1996-01-01), Tsuji et al.
patent: 5530550 (1996-06-01), Nikoonahad et al.
patent: 5650614 (1997-07-01), Yasutake et al.
patent: 5672885 (1997-09-01), Allen et al.
patent: 5712701 (1998-01-01), Dementi et al.
patent: 5798829 (1998-08-01), Vaez-Iravani
patent: 5929983 (1999-07-01), Lu
patent: 5940175 (1999-08-01), Sun
patent: 6084664 (2000-07-01), Matsumoto et al.
patent: 6118525 (2000-09-01), Fossey et al.
patent: 6169601 (2001-01-01), Eremin et al.
patent: 6201601 (2001-03-01), Vaez-Iravani et al.
patent: 6292259 (2001-09-01), Fossey et al.
patent: 6538730 (2003-03-01), Vaez-Iravani et al.
patent: 6618134 (2003-09-01), Vaez-Iravani et al.
patent: 6639662 (2003-10-01), Vaez-Iravani et al.
patent: 6657715 (2003-12-01), Vaez-Iravani et al.
patent: 20010052975 (2001-12-01), Biellak et al.
patent: 4123916 (1992-01-01), None
patent: 0624787 (1994-11-01), None
patent: WO9615354 (1996-09-01), None
patent: WO9704134 (1997-03-01), None
patent: WO9712226 (1997-04-01), None
patent: WO 9733158 (1997-09-01), None
patent: WO9914575 (1999-03-01), None
“Surface Inspection System for Estimation of Wafer, ” Y. Yatsugake et al.,Hitachi Electronics Engineering Technical Report,vol. 11, Jan. 1996, pp. 21-26.
Figure, Hitachi Electronics Engineering Co., Ltd., presented by Etsuro Morita of Mitsubishi Materials Silicon Corp. in a presentation entitled “Exploration of COP and COP Defect Crystal Originated ‘Particles’” at the 6thInternational Workshop on 300 Millimeter Wafers on Dec. 5, 1996 in Makuhari, Japan.
Partial European Search Report dated Oct. 18, 2000.
Search Report Corresponding to PCT Application No. PCT/US98/19564 issued by the International Patent Office on Feb. 8, 1999.

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