Sample holder for a sample to be subjected to radiation analysis

Details Sample holder for a sample to be subjected to radiation analysis Sample holder for a sample to be subjected to radiation analysis

1996-09-20

1998-11-03

Williams, Hezron E.

Measuring and testing

Sampler, sample handling, etc.

Sample holder

356244, 356246, 25044011, G01N 3700

Patent

active

058311840

ABSTRACT:
For TXRF (Total Reflection XRF) or GEXRF (Grazing Emission XRF) a very flat sample surface and a suitably defined region in which the sample material is present are often required. Both requirements can be satisfied by means of a (preferably synthetic) sample carrier on which a first region which has a small liquid contact angle is surrounded by a second region having a large contact angle. When applied in the first region, a droplet of solvent containing the sample material will completely wet said region, whereas the second region will not be wetted. As the solvent evaporates, the boundary of the droplet does not retreat but the first region remains fully wetted, resulting in uniform coverage of this region by sample material and also in a suitably defined sample spot.

REFERENCES:
patent: 4473457 (1984-09-01), Columbus
patent: 4957582 (1990-09-01), Columbus
patent: 5544218 (1996-08-01), Turner et al.

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