Sample and method for evaluating resolution of scanning...

Radiant energy – Calibration or standardization methods

Reexamination Certificate

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C250S311000, C250S306000, C250S307000, C250S310000

Reexamination Certificate

active

07605364

ABSTRACT:
In the case of monitoring a resolution of a scanning electron microscope, it is required to prepare a sample and to use a measuring algorithm so as to reduce the pattern dependency of an index value of resolution to be measured in order to measure a variation in the size of an electron beam with a high degree of accuracy. According to the present invention, there is used a sample having a sectional shape which is appropriate for monitoring the resolution, that is, the sample has a pattern with such a sectional shape that a side wall of the pattern is inclined so as to prevent an electron beam irradiated on the sample from impinging upon the side wall of the pattern. With this configuration, it is possible carry out such resolution monitor that does not depend upon a sectional shape of a pattern.

REFERENCES:
patent: 5969273 (1999-10-01), Archie et al.
patent: 6054710 (2000-04-01), Bruggeman
patent: 6080987 (2000-06-01), Belcher et al.
patent: 6545275 (2003-04-01), Pearl et al.
patent: 2005-268231 (2005-09-01), None
Joy, et al,; Metrics of resolution and performance for CD-SEMs; In Metrology, Inspection, and Process Control for Microlithography XIV; Proceedings of SPIE 2000; pp. 108-114, vol. 3998.
Archie, et al.; Modeling and Experimental Aspects of Apparent Beam Width as an Edge Resolution Measure; Part of the SPIE Conference on Metrology, Inspection, and Process Control for Microlithography XIII; SPIE Mar. 1999; pp. 669-685; vol. 3677.
Ishitani, et al.; Contrast-to-gradient method for the evaluation of image resolution taking account of random noise in scanning electron microscopy; Japanese Electron of Microscopy; Mar. 31, 2004; pp. 245-255; vol. 53, No. 3.

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