Sample analysis apparatus and analysis method

Optics: measuring and testing – Of light reflection

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07812955

ABSTRACT:
A light beam irradiating optical system is associated with a dielectric material member having a surface, on which a thin film layer has been formed, a sample being brought into contact with a surface of the thin film layer. The light beam irradiating optical system produces and irradiates a light beam to an interface between the dielectric material member and the thin film layer. The light beam is constituted of light beam components, which have various different incidence angles with respect to the interface, and which have intensities varying in accordance with the incidence angles. A single measuring detector for outputting a signal representing an intensity of an entire area of received light is secured and located so as to receive the light beam having been reflected from the interface.

REFERENCES:
patent: 4429218 (1984-01-01), Thomas
patent: 4668044 (1987-05-01), D'Auria et al.
patent: 4997278 (1991-03-01), Finlan et al.
patent: 5245410 (1993-09-01), Villuendas Yuste et al.
patent: 5508809 (1996-04-01), Peacock et al.
patent: 5875032 (1999-02-01), Naya
patent: 5912456 (1999-06-01), Melendez
patent: 5923031 (1999-07-01), Naya
patent: 6111652 (2000-08-01), Melendez et al.
patent: 2004/0130723 (2004-07-01), Yager et al.
patent: 0834848 (1998-08-01), None
patent: 1138443 (1989-05-01), None
patent: 6-167443 (1994-06-01), None
patent: 9292334 (1997-11-01), None
patent: 10206318 (1998-08-01), None
patent: 10-239233 (1998-09-01), None
patent: 11051857 (1999-02-01), None
patent: 2000356586 (2000-12-01), None
patent: 2001041881 (2001-02-01), None
patent: 2003139692 (2003-05-01), None
patent: 2004053372 (2004-02-01), None
Takayuki Okamoto, “Surface Refracto-Sensor using Evanescent Waves: Principles and Instrumentations”, Spectrum Researches, pp. 19-28, vol. 47, No. 1.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sample analysis apparatus and analysis method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sample analysis apparatus and analysis method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sample analysis apparatus and analysis method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4237829

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.