Salt suitable for an acid generator and a chemically...

Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acid esters

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C560S001000, C560S150000, C430S270100

Reexamination Certificate

active

11516644

ABSTRACT:
The present invention provides a salt of the formula (I):wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1and Q2each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2.The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

REFERENCES:
patent: 2003/0194639 (2003-10-01), Miya et al.
patent: 2006/0194982 (2006-08-01), Harada et al.
patent: DD 295421 (1991-10-01), None
patent: 2004-117959 (2004-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Salt suitable for an acid generator and a chemically... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Salt suitable for an acid generator and a chemically..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Salt suitable for an acid generator and a chemically... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3900168

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.