Sacrificial metal etchback system

Details Sacrificial metal etchback system Sacrificial metal etchback system

1992-08-27

1994-07-19

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156656, 118723R, 118728, H01L 2100

Patent

active

053306074

ABSTRACT:
An etchback apparatus for use in integrated circuit processing after via fill to remove excess metal and leave plugged vias, has a sacrificial ring with a surface consisting substantially of a metal that etches much like the metal used to fill the vias. The excess surface area in the process provides sacrificial metal so microloading is avoided. he metal used to fill the vias.

REFERENCES:
patent: 4350578 (1982-09-01), Frieser et al.
patent: 4563240 (1986-01-01), Shibata et al.
patent: 4793975 (1988-12-01), Drage
patent: 4980018 (1990-12-01), Mu et al.

Affiliated with

Also associated with

Rating

Sacrificial metal etchback system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sacrificial metal etchback system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sacrificial metal etchback system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-517497