Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...
Reexamination Certificate
2005-06-09
2009-02-03
Peng, Kuo-Liang (Department: 1796)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From silicon reactant having at least one...
C528S041000, C528S039000, C528S032000
Reexamination Certificate
active
07485690
ABSTRACT:
A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2):in-line-formulae description="In-line Formulae" end="lead"?X—Y—SiZ3 (1)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?RnSiZ4-n (2)in-line-formulae description="In-line Formulae" end="tail"?wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.
REFERENCES:
patent: 6268457 (2001-07-01), Kennedy et al.
patent: 6506497 (2003-01-01), Kennedy et al.
patent: 6873387 (2005-03-01), Hokazono et al.
patent: 7202013 (2007-04-01), Ogihara et al.
patent: 2003-502449 (2003-01-01), None
patent: WO-00/77575 (2000-12-01), None
Asano Takeshi
Hamada Yoshitaka
Iwabuchi Motoaki
Ogihara Tsutomu
Pfeiffer Dirk
Birch & Stewart Kolasch & Birch, LLP
International Business Machines - Corporation
Peng Kuo-Liang
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Sacrificial film-forming composition, patterning process,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sacrificial film-forming composition, patterning process,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sacrificial film-forming composition, patterning process,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4055071