Rust removal and composition thereof

Details Rust removal and composition thereof Rust removal and composition thereof

1987-10-21

1989-03-07

Wax, Robert A.

Compositions

Dust suppressants for bulk materials, or processes of...

134 2, 134 3, 252 86, 252181, 422 14, 422 15, C02F 514

Patent

active

048104051

ABSTRACT:
Iron oxide deposits are removed from substrates by use of aqueous solution at approximately neutral pH containing a phosphonate (e.g., hydroxyethylidene diphosphonic acid), a reducing agent (e.g., sodium sulfite), and a corrosion inhibitor (e.g., benzotriazole). Optionally, a surfactant and dispersant may be included.

REFERENCES:
patent: 3072502 (1963-01-01), Alfano
patent: 3803047 (1974-04-01), Hwa
patent: 3803048 (1974-04-01), Hwa
patent: 3879288 (1975-04-01), Siegele
patent: 3898037 (1975-08-01), Lange et al.
patent: 3941562 (1976-03-01), Hollingshad
patent: 4067690 (1978-01-01), Cuisia et al.
patent: 4132526 (1979-01-01), Schwarz et al.
patent: 4278635 (1981-07-01), Kerst
patent: 4279768 (1981-07-01), Busch
patent: 4342652 (1982-08-01), Schiller et al.
patent: 4350606 (1982-08-01), Cuisia et al.
patent: 4430128 (1984-02-01), Frenier et al.
patent: 4600524 (1986-07-01), Cuisia et al.
patent: 4631131 (1986-12-01), Cuisia et al.
patent: 4649025 (1987-03-01), Hwa et al.
patent: 4664811 (1987-05-01), Operhofer
1983 The Merck Index--10th Edition, p. 4961.
5/87 Water Treatment Report--p. 19.
8/84 Poulos--"A Comparative Study on the Dissolution of Magnetite by Organic Acids", pp. 19-21, Materials Performance.
1984 Frenier--"The Mechanism of Magnetite Dissolution in Chelant Solutions", pp. 176, 178, 190--Corrosion vol. 40, No. 4.

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