Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-09-09
1995-12-05
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2726, G01N 27447
Patent
active
054725895
ABSTRACT:
An electrophoretic cell comprising a base member defining a planar support surface is disclosed. A layer of electrophoretic gel medium is disposed on the planar plastic support surface. A glass top face is disposed over the layer of gel. The gel lies between the top face and the base member. Either the top face or the base member is made of transparent material. A plurality of reservoirs are defined between the top face and the base member by the top face and base member. The reservoirs are defined by a plurality of walls disposed between the top face and the base member, and may be integral with the base member. Two opposite edges of the electrophoretic cell are provided with a band of material which is adhered thereto whereby additional strength is provided to the electrophoretic cell.
REFERENCES:
patent: 4035377 (1977-07-01), Detroy
patent: 5073246 (1991-12-01), Chu et al.
patent: 5284565 (1994-02-01), Chu et al.
Niebling John
Starsiak Jr. John S.
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