Rubidium-cesium-antimony photocathode

Details Rubidium-cesium-antimony photocathode Rubidium-cesium-antimony photocathode

1981-01-28

1982-05-25

Hoffman, James R.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

148 63, 427 74, B05D 134, B05D 138, B05D 304

Patent

active

043317014

ABSTRACT:
A film of either manganese or antimony is evaporated onto a substrate within an evacuated enclosure. Oxygen is introduced into the enclosure to oxidize the film. A layer of antimony is then deposited onto the oxidized film to a predetermined thickness measured by the transmission of light through the substrate. Rubidium and cesium are then evaporated onto the antimony layer after which the substrate is heated to promote an activating reaction between the rubidium, cesium and antimony. Photocathodes formed in this manner, without superficial oxidation, typically have sensitivities within the range of 80-130 microamperes per lumen.

REFERENCES:
patent: 3434876 (1969-03-01), Stoudenheimer et al.
patent: 4039887 (1977-08-01), McDonie
Morrison, "Technique for Producing High-Sensitivity Rubidium-Cesium-Antimony Photocathodes" J. Applied Physics, vol. 37, No. 2, pp. 713-715, Feb. 1966.

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