Etching a substrate: processes – Nongaseous phase etching of substrate – Substrate is multilayered
Patent
1995-01-26
1998-01-06
Dang, Thi
Etching a substrate: processes
Nongaseous phase etching of substrate
Substrate is multilayered
216100, 216108, 216 35, 216 34, 427309, C23F 100
Patent
active
057050821
ABSTRACT:
A process for roughening a metal surface is provided comprising applying a coating to the metal surface wherein the coating is a temporary barrier to an etchant attacking the metal surface and the coating is susceptible to the etchant gradually removing the coating, and then etching the coated metal surface with an aqueous bath containing the etchant effective to produce a roughened metal surface.
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Bittman Mitchell D.
Chromalloy Gas Turbine Corporation
Dang Thi
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