Rotational stage with vertical axis adjustment

Details Rotational stage with vertical axis adjustment Rotational stage with vertical axis adjustment

2005-07-12

2005-07-12

Pham, Hoa Q. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S399000, C356S244000

Reexamination Certificate

active

06917420

ABSTRACT:
A stage system is disclosed for supporting and positioning a semiconductor wafer for inspection in an optical metrology device. A chuck for supporting a wafer is mounted to the stage system. The stage system can move the chuck along two linear orthogonal axes. A rotational stage is also provided for rotating the chuck. A mechanism is provided for adjusting the vertical position of a chuck to allow for focusing of the probe beam of the metrology device. The vertical adjustment mechanism is designed so that it does impede the rotational positioning of the chuck.

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