Rotational megasonic cleaner/etcher for wafers

Details Rotational megasonic cleaner/etcher for wafers Rotational megasonic cleaner/etcher for wafers

1996-11-25

1997-09-30

Czaja, Donald E.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 33, 134158, 134159, 134902, 437 9, 437225, 437946, B08B 308, B08B 312

Patent

active

056722125

ABSTRACT:
A method and apparatus for a wafer processing apparatus using a rotation mechanism. Wafers 13 are placed into a carrier 1 which has a central axis. The carrier 1 and wafers 13 are placed into a megasonic tank 15 with a megasonic transducer 23. A rotational driving system 25 is used to rotate the wafer carrier 1 and the wafers 13 about the central axis while the wafers are in the tank 1. Other embodiments are provided.

REFERENCES:
patent: 4325394 (1982-04-01), Reams
patent: 4750505 (1988-06-01), Inuta et al.
patent: 4850381 (1989-07-01), Moe et al.
patent: 4980300 (1990-12-01), Miyashita et al.
patent: 5464480 (1995-11-01), Matthews

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