Rotating resonator for large substrate tables in sputtering syst

Details Rotating resonator for large substrate tables in sputtering syst Rotating resonator for large substrate tables in sputtering syst

1978-08-14

1979-10-09

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1500

Patent

active

041705416

ABSTRACT:
An RF sputtering system having a rotating substrate table includes a resonant circuit adapted to rotate with the substrate table whereby reactive currents need not propagate across the rotating RF connector through which RF power is supplied to the rotating table.

REFERENCES:
patent: 3775285 (1973-11-01), Lane
patent: 4021277 (1977-05-01), Shirn et al.
patent: 4025410 (1977-05-01), Stewart
W. Pennebaker, "Impedance Matching Circuit for RF Sputtering System", IBM Tech. Disc. Bull., vol. 19, pp. 2809-2810, (1976).
R. P. Auyang et al., "Power Network for Substrate", IBM Tech. Disc. Bull., vol. 14, p. 1032, (1971).

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