Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-08-04
1996-10-22
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429822, C23C 1435
Patent
active
055672892
ABSTRACT:
A rotatable magnetron cathode having at least one supported end adapted for attachment to a spindle. At least one dark space shield is attached to the cathode at a supported end to rotate therewith, and is electrically floating relative to the cathode. If the cathode is cantilever mounted, a floating cone end shield, facing away from the gas discharge and not overlapping the cylindrical cathode wall, is used at the free end.
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Crowley Daniel T.
Taylor Clifford L.
Egan, III William J.
Viratec Thin Films, Inc.
Weisstuch Aaron
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