Rotating cylindrical magnetron structure for large area coating

Details Rotating cylindrical magnetron structure for large area coating Rotating cylindrical magnetron structure for large area coating

1990-11-06

1992-03-17

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, C23C 1435

Patent

active

050965620

ABSTRACT:
Mechanisms for supporting, rotating, cooling and energizing a cylindrical target structure in a magnetron through supports at each end of the target structure. Two specific configurations are described. Particular arrangements of magnets are provided within the target cylinder. Two adjacent rotating target cylinders may optionally be employed in order to increase the rate of depositing sputtered material on a substrate. The various features of this invention are particularly adapted for a large-scale cylindrical magnetron used for sputtering coatings on architectural glass panels, automobile windshields and the like, but are also advantageous for use in coating very small substrates.

REFERENCES:
patent: 3718572 (1973-02-01), Robison et al.
patent: 4356073 (1982-10-01), McKelvey
patent: 4417968 (1983-11-01), McKelvey
patent: 4422916 (1983-12-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4445997 (1984-05-01), McKelvey
patent: 4466877 (1984-08-01), McKelvey
M. Wright et al., J. Vac. Sci. Technol., A4, No. 3, May/Jun. 1986, pp. 388-392.
Shatterproof Glass Corp., "Architectural Dept. Rotatable Magnetron II Assembly", Sep. 26, 1985.

Affiliated with

Also associated with

Rating

Rotating cylindrical magnetron structure for large area coating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rotating cylindrical magnetron structure for large area coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rotating cylindrical magnetron structure for large area coating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1473432