Rotating cylindrical magnetron structure for large area coating

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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20429809, C23C 1435

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active

050965620

ABSTRACT:
Mechanisms for supporting, rotating, cooling and energizing a cylindrical target structure in a magnetron through supports at each end of the target structure. Two specific configurations are described. Particular arrangements of magnets are provided within the target cylinder. Two adjacent rotating target cylinders may optionally be employed in order to increase the rate of depositing sputtered material on a substrate. The various features of this invention are particularly adapted for a large-scale cylindrical magnetron used for sputtering coatings on architectural glass panels, automobile windshields and the like, but are also advantageous for use in coating very small substrates.

REFERENCES:
patent: 3718572 (1973-02-01), Robison et al.
patent: 4356073 (1982-10-01), McKelvey
patent: 4417968 (1983-11-01), McKelvey
patent: 4422916 (1983-12-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4445997 (1984-05-01), McKelvey
patent: 4466877 (1984-08-01), McKelvey
M. Wright et al., J. Vac. Sci. Technol., A4, No. 3, May/Jun. 1986, pp. 388-392.
Shatterproof Glass Corp., "Architectural Dept. Rotatable Magnetron II Assembly", Sep. 26, 1985.

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