Rotating belt wafer edge cleaning apparatus

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

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Details

134902, 15 971, 15102, 451 44, B08B 700, A47L 102

Patent

active

058688579

ABSTRACT:
An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.

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