Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1984-05-07
1986-05-13
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041832, 2041823, G01N 2728
Patent
active
045884927
ABSTRACT:
This disclosure is directed to an isoelectric focusing apparatus, wherein stabilization of the fluid containing the isolated proteins is achieved by carrying out the separation in a rotating cylinder with the separation cavity of the cylinder being segmented by means of filter elements. The filter elements are constituted of a material offering some degree of resistance to fluid convection, but allowing relatively free and unhindered passage of current and transport of proteins. The combined effect of segmentation and rotation has been found to be superior to either segmentation or rotation alone in maintaining the stability of the migrated fractions.
REFERENCES:
patent: 3844926 (1974-10-01), Smyth et al.
patent: 4040940 (1977-08-01), Bier
patent: 4177130 (1979-12-01), Herrmann et al.
patent: 4204929 (1980-05-01), Bier
patent: 4310408 (1982-01-01), Rose et al.
patent: 4362612 (1982-12-01), Bier
patent: 4465583 (1984-08-01), Lovegrove
Boggs Jr. B. J.
Koffsky David N.
Niebling John F.
University Patents Inc.
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