Rotatable vacuum chuck with magnetic means

Details Rotatable vacuum chuck with magnetic means Rotatable vacuum chuck with magnetic means

1990-07-24

1991-08-27

Hoag, Willard

Coating apparatus

With means to centrifuge work

118319, 118500, 269 21, 269276, 269305, B05C 1300

Patent

active

050424211

ABSTRACT:
A rotating head assembly of apparatus for applying a liquid photoresist solution to a semiconductor wafer includes a lower disk and an upper disk to be placed on the surface of the lower disk. On the surface of the lower disk, there are provided ribs for positioning the upper disk and the wafer so as to align the center thereof into the center of rotation. The height of the rib and the thickness of the upper disk are respectively the same as the thickness of the wafer. Magnetic means holds the upper and lower disk together.

REFERENCES:
patent: 3990689 (1976-11-01), Eklund
patent: 4086870 (1978-05-01), Canavello et al.
patent: 4131267 (1978-12-01), Ono et al.
patent: 4280689 (1981-07-01), Frosch et al.
patent: 4504045 (1985-03-01), Kenbo et al.
patent: 4711610 (1987-12-01), Riehl
patent: 4790262 (1988-12-01), Makayama et al.
patent: 4903817 (1990-02-01), Summitsch

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