Coating apparatus – Control means responsive to a randomly occurring sensed... – Temperature responsive
Patent
1989-03-29
1991-03-05
Nozick, Bernard
Coating apparatus
Control means responsive to a randomly occurring sensed...
Temperature responsive
118730, 118 69, 118500, B05C 1100
Patent
active
049969420
ABSTRACT:
A rotatable substrate supporting mechanism for use in a chemical vapor deposition reaction chamber of the type used in producing semi-conductor devices is provided with a susceptor for supporting a single substrate, or wafer, for rotation about an axis normal to the wafer. The mechanism is provided with a temperature sensing system for producing signals indicative of sensed temperatures taken at the center of the susceptor and at various points about the periphery thereof. A gas purging system is provided for inhibiting the flow of reactant gas in unwanted areas of the reaction chamber and in the supporting system itself. Rotational driving of the mechanism is accomplished by a variable speed motor under control of a circuit which stops and starts the rotation at controlled speeds and stops the rotation at a home position for enhancing the handling of the wafers.
REFERENCES:
patent: 4770121 (1988-09-01), Ebata et al.
patent: 4821674 (1989-04-01), de Boer et al.
patent: 4839145 (1989-06-01), Gale et al.
deBoer Wiebe B.
Ozias Albert E.
Epsilon Technology Inc.
Nozick Bernard
LandOfFree
Rotatable substrate supporting susceptor with temperature sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Rotatable substrate supporting susceptor with temperature sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rotatable substrate supporting susceptor with temperature sensor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-490590