Rotatable sputtering apparatus

Details Rotatable sputtering apparatus Rotatable sputtering apparatus

1983-08-17

1984-05-01

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044459971

ABSTRACT:
A magnetron cathode for sputter-coating non-planar substrates, which includes a rotatable elongated tubular member having a layer of the coating material to be sputtered applied to the outer surface thereof, and magnetic means mounted in said tubular member, said tubular member being contoured longitudinally to provide a non-cylindrical sputtering surface.

REFERENCES:
patent: 4221652 (1980-09-01), Kuriyama
patent: 4290877 (1981-09-01), Blickensderfer
patent: 4356073 (1982-10-01), McKelvey
patent: 4362632 (1982-12-01), Jacob
patent: 4374722 (1983-02-01), Zega
patent: 4376025 (1983-03-01), Zega

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