Rotary wafer drier

Details Rotary wafer drier Rotary wafer drier

1989-09-27

1991-01-29

Bennet, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34184, F26B 1724

Patent

active

049876872

ABSTRACT:
A rotary wafer drying apparatus comprises a rotatable rotor for applying centrifugal force to the wafers, and a motor for rotating the rotor. A pair of cradles, attached to the rotor, receive a plurality of wafers arranged vertically. When the wafers are to be dried, the cradles are rotated by about 90.degree. from the state of reception, with the wafers maintained approximately at the horizontal state. When wafers of different diameters are to be dried and the size of the cradles should be changed correspondingly, not the rotor itself but only the pair of cradles in the rotor are changed.

REFERENCES:
patent: 4677759 (1987-07-01), Inamura
patent: 4777732 (1988-10-01), Hirano
patent: 4848006 (1989-07-01), Seiichiro

Affiliated with

Also associated with

Rating

Rotary wafer drier does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rotary wafer drier, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rotary wafer drier will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-806324