Rotary-type wafer drying apparatus with anti-deflection cover

Details Rotary-type wafer drying apparatus with anti-deflection cover Rotary-type wafer drying apparatus with anti-deflection cover

1993-08-30

1995-02-07

Gromada, Denise L.

Drying and gas or vapor contact with solids

Process

By centrifugal force

34312, 34186, F26B 508

Patent

active

053866452

ABSTRACT:
A rotary-type wafer drying apparatus includes a deflection prevention protecting plate attached to a cradle for a wafer, for diminishing rebounding of dewaterized water. A free side of the protecting plate in the cradle containing wafer maintains an appropriate angle with the cradle and the transverse length of the plate is longer than the transverse length of the radially outward side of the cradle.

REFERENCES:
patent: 3824701 (1974-07-01), Norquist
patent: 4445281 (1984-05-01), Aigoo
patent: 4489501 (1984-12-01), Aigo
patent: 4489502 (1984-12-01), Aigo
patent: 4848006 (1989-07-01), Seiichiro

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