Rotary sputtering cathode

Details Rotary sputtering cathode Rotary sputtering cathode

1991-06-10

1992-10-27

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429809, 20429826, 20429828, C23C 1434

Patent

active

051586606

ABSTRACT:
A vacuum sputtering cathode has a hollow structure (2) able to rotate about its axis and a magnetic confinement circuit (3) arranged peripherally about said structure. The cathode according to the invention is particularly suitable for the rapid dissipation of the thermal energy given off by the sputtering process and in particular for the sputtering of metals with a low melting point.

REFERENCES:
patent: 4443318 (1984-04-01), McKelvey
patent: 4445997 (1984-05-01), McKelvey
patent: 5047131 (1991-09-01), Wolfe et al.
Wright et al., "Design . . . Magnetron", J. Vac. Sci. Technol May-Jun 4, 1986, No. 3.

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