Rotary drier apparatus for semiconductor wafers

Details Rotary drier apparatus for semiconductor wafers Rotary drier apparatus for semiconductor wafers

1986-07-08

1987-07-07

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34 8, 34186, F26B 1732

Patent

active

046777598

ABSTRACT:
A rotary drier apparatus for drying semiconductor wafers within a vessel. The rotary drier apparatus has a turntable driven by a motor, support plates mounted on the turntable, cradles suspended pivotally from the support plates with the aid of a rotary shaft, and a stopper for stopping the cradles from touching each other in a nonrotating state. The centers of gravity of the cradles are located outwardly of a portion just under the pivotal axes of the cradles.

REFERENCES:
patent: 4310119 (1982-01-01), Culhane et al.
patent: 4313266 (1982-02-01), Tam
patent: 4525938 (1985-07-01), Aigo

Affiliated with

Also associated with

Rating

Rotary drier apparatus for semiconductor wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rotary drier apparatus for semiconductor wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rotary drier apparatus for semiconductor wafers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1655306