Rotary cleaning method with chemical solutions and rotary cleani

Details Rotary cleaning method with chemical solutions and rotary cleani Rotary cleaning method with chemical solutions and rotary cleani

1994-06-20

1996-01-30

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

1341022, 134 992, 1341023, 134902, 134153, 134 971, B08B 304

Patent

active

054873983

ABSTRACT:
To provide a cleaning method and a cleaning apparatus for decreasing the total cost by producing high-performance semiconductor using silicon wafers with cleaner surface, decreasing the semiconductor production cost, decreasing the consumption of chemical solutions and the cleaning time by using a new cleaning method and apparatus, simplifying the recovery of waste liquids, and decreasing equipment investment.
A cleaning method having a plurality of chemical-solution-cleaning processes characterized by performing a chemical-solution-cleaning process for continuously feeding a chemical solution to the surface of an object to be cleaned from an upper part of the object surface by horizontally setting the object in a cleaning bath, closing the bath, and then rotating the object and an ultrapure-water-cleaning process for feeding ultrapure water in order for each chemical solution in the same cleaning bath; and thereafter drying the object after cleaning it.

REFERENCES:
patent: 4982753 (1991-01-01), Grebinski et al.
patent: 5154199 (1992-10-01), Thompson et al.
patent: 5361787 (1994-11-01), Miyazaki et al.
patent: 5361789 (1994-11-01), Yoshida et al.
patent: 5372652 (1994-12-01), Srikrishnan et al.

Affiliated with

Also associated with

Rating

Rotary cleaning method with chemical solutions and rotary cleani does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rotary cleaning method with chemical solutions and rotary cleani, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rotary cleaning method with chemical solutions and rotary cleani will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-152863