Room temperature ferromagnetic semiconductor grown by plasma...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C438S034000, C257S075000, C365S158000, C365S171000

Reexamination Certificate

active

07063986

ABSTRACT:
A 3 group–5 group compound ferromagnetic semiconductor, comprising one material ‘A’ selected from the group of Ga, Al and In and one material ‘B’ selected from the group consisting of N and P, wherein one material ‘C’ selected from the group consisting of Mn, Mg, Co, Fe, Ni, Cr and V is doped as a material for substituting the material ‘A’, the compound semiconductor has a single phase as a whole. The ferromagnetic semiconductor can be fabricated by a plasma-enhance molecular beam epitaxy growing method and since it shows the ferromagnetic characteristics at a room temperature, it can be applied as various spin electron devices.

REFERENCES:
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patent: 2005/0202614 (2005-09-01), Spruytte et al.
patent: 2005/0269593 (2005-12-01), Chowdhury et al.
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patent: 2003-528456 (2003-09-01), None
Cui et al. U.S. Appl. No. 60/364,989 filed Mar. 14, 2002.
Sonoda, Saki, et al., “Properties of Ferromagnetic Ga1-xMnxN Films Grown by Ammonia-MBE”, IEEE Transactions on Magnetics, Sep. 2002, vol. 38, No. 5, pp. 2859-2862.

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