Roller with treading and system including the same

Details Roller with treading and system including the same Roller with treading and system including the same

1996-08-29

1999-01-26

Spisich, Mark

Brushing, scrubbing, and general cleaning

Machines

Brushing

15 883, 134902, 492 27, 492 30, B08B 302, B08B 104, B08B 1100

Patent

active

058625607

ABSTRACT:
A method and apparatus for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.

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