Roll-off reducing agent

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means

Reexamination Certificate

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C252S079100, C252S079400

Reexamination Certificate

active

09842769

ABSTRACT:
A roll-off reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; and a roll-off reducing agent composition comprising a roll off-reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; an abrasive; and water.

REFERENCES:
patent: 3839536 (1974-10-01), Sato et al.
patent: 4915710 (1990-04-01), Miyazaki et al.
patent: 5476606 (1995-12-01), Brancaleoni et al.
patent: 5693239 (1997-12-01), Wang et al.
patent: 5733819 (1998-03-01), Kodama et al.
patent: 5759917 (1998-06-01), Grover et al.
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5858813 (1999-01-01), Scherber et al.
patent: 5989515 (1999-11-01), Watanabe et al.
patent: 6015506 (2000-01-01), Streinz et al.
patent: 6027554 (2000-02-01), Kodama et al.
patent: 6037260 (2000-03-01), Tsai et al.
patent: 6258140 (2001-07-01), Shemo et al.
patent: 6309434 (2001-10-01), Ohashi et al.
patent: 6379406 (2002-04-01), Thomas et al.
patent: 6488729 (2002-12-01), Ishitobi et al.
patent: 6569216 (2003-05-01), Taira et al.
patent: 6607571 (2003-08-01), Ishitobi et al.
patent: 2003/0029095 (2003-02-01), Ishitobi et al.
patent: A2084485 (1990-03-01), None
patent: 7-70553 (1995-03-01), None
patent: A7216345 (1995-08-01), None
patent: 9-208933 (1997-08-01), None
patent: A9286975 (1997-11-01), None
patent: 9-316430 (1997-12-01), None
patent: 10-88111 (1998-04-01), None
patent: A11092749 (1999-04-01), None
patent: A2000063805 (2000-02-01), None
patent: 2001-98254 (2001-04-01), None
patent: 2001-131535 (2001-05-01), None
patent: 2001-155332 (2001-06-01), None
patent: 2001-187878 (2001-07-01), None
patent: 2001-187879 (2001-07-01), None
patent: 2001-189296 (2001-07-01), None
patent: 2002-12855 (2002-01-01), None
patent: 2003-510446 (2003-03-01), None
Mravic et al , Composition for the Chemical Mechanical Polishing of Metal Layers, Jun. 17, 1999, PCT WO 99/67056, 21 pages.

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