Robust single-chip hydrogen sensor

Measuring and testing – Gas analysis

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C073S031050, C073S023310, C422S090000, C422S094000, C338S034000

Reexamination Certificate

active

06450007

ABSTRACT:

FIELD
The present invention is related to hydrogen sensors, and more particularly, to a robust single-chip hydrogen sensor and method for manufacturing the same.
BACKGROUND
During the early 1990s, Sandia National Laboratory developed a single-chip hydrogen sensor that utilized Palladium-Nickel (PdNi) metal films as hydrogen gas sensors. U.S. Pat. No. 5,279,795, naming Robert C. Hughes and W. Kent Schubert as inventors, assigned to the United States as represented by the U.S. Department of Energy, describes such a sensor and is incorporated by reference herein.
One of the key benefits of the sensor described in the '795 patent is its ability to detect a dynamic range of hydrogen concentrations over at least six orders of magnitude. Prior solutions to the problem of detecting hydrogen concentrations had been generally limited to detecting low concentrations of hydrogen. These solutions include such technologies as metal-insulator-semiconductor (MIS) or metal-oxide-semiconductor (MOS) capacitors and field-effect-transistors (FET), as well as palladium-gated diodes.
The hydrogen sensor described in the '795 patent was a notable advance in hydrogen-sensing technology. It was, however, primarily limited to an experimental laboratory environment due to the difficulties encountered in manufacturing such a sensor.
In typical silicon fabrication facilities, metal films are first blanket-deposited across the entire wafer, and are subsequently patterned by an etch process. However, conventional etchants for PdNi also attack aluminum, which is present on the wafer surface as an interconnect metal before the PdNi film is deposited. Patterning the PDNI by etching would also attack the unprotected aluminum, destroying the sensor. Even some non-conventional semiconductor fabrication techniques involving the use of a photoresistive material applied before the PdNi in a “lift-off” process have produced very low yields in tests performed by the assignee of the present invention. Low yields in the production of semiconductor devices typically translates to difficulties in producing a commercializable product.
It would be desirable to provide a robust single-chip hydrogen sensor that is capable of sensing hydrogen concentrations over a broad range, such as from less than 1% to approximately 100% concentrations.
It would also be desirable for such a sensor to be efficiently manufacturable, so that costs are reduced and the sensor is producible in high enough yields to enable commercialization.
It would be desirable for such a sensor to provide measurement results that approximate or improve on the results from previous hydrogen sensors.
It would additionally be desirable to minimize sensor drift and to improve device-to-device and wafer-to-wafer repeatability.
SUMMARY
In accordance with an illustrative embodiment of the present invention, some of the problems associated with manufacturing a robust hydrogen sensor are addressed.
Various embodiments of the invention provide a robust single-chip hydrogen sensor and a method for fabricating such a sensor. By adding an adhesion-promoting layer between the body of a sensor and an on-chip resistive hydrogen-sensing element, device yields are improved when compared to directly applying the resistive hydrogen-sensing elements to the sensor body.
According to a preferred embodiment of the present invention, the adhesion-promoting layer is a chromium (Cr) adhesion layer, and the resistive hydrogen-sensing element is a PdNi alloy.


REFERENCES:
patent: 4977658 (1990-12-01), Awano et al.
patent: 5279795 (1994-01-01), Hughes et al.
patent: 5367283 (1994-11-01), Lauf et al.
patent: 5493897 (1996-02-01), Nomura et al.
patent: 5668301 (1997-09-01), Hunter
patent: 5698771 (1997-12-01), Shields, et al.
patent: 6006582 (1999-12-01), Bhandari et al.
patent: 6041643 (2000-03-01), Stokes et al.
patent: 6114943 (2000-09-01), Lauf
patent: 6155099 (2000-12-01), Kobayashi et al.
patent: 6182500 (2001-02-01), Stokes et al.
Author: Yang-Tse Cheng, Yang Li, Dan Lisi, W. M. Wang, Title: “Preparation And Characterization of Pd/Ni Thin Films For Hydrogren Sensing”, in the Sensors and Actuators B 30 (1996) 11-16, Article Received Sep. 5, 1994; revised Jan. 17, 1995; accepted Jan. 20, 1995, pp. 11-16.
Author: R. C. Hughes, W. K. Schubert, Title: “Thin Films Of Pd/Ni Alloys For Detection Of High Hydrogen Concentrations”, in the J. Appl Phys. 71 (1), Jan. 1, 1992, Received May 23, 1991, accepted for publication Sep. 27, 1991, pp. 542-544.
Author: R. C. Hughes, T. J. Boyle, T. J. Gardner, C. J. Brinker and Ross Thomas, Title: “Thin Film Porous Membranes For Catalytic Sensors”, in the Digest of the 1997 International Conference on Solid State Sensors and Actuators, Transducers '97, Pages: All Pages.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Robust single-chip hydrogen sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Robust single-chip hydrogen sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Robust single-chip hydrogen sensor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2855166

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.