Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Silver compound sensitizer containing
Patent
1998-12-22
2000-04-11
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Silver compound sensitizer containing
430603, 430611, G03C 1015, G03C 1035, G03C 107
Patent
active
06048683&
ABSTRACT:
A method is disclosed of manufacturing radiation-sensitive emulsions by a pulsed flow double-jet process in which high chloride silver halide grains are grown in the presence of a thioether ripening agent in the dispersing medium in the reaction vessel the silver halide grains exhibiting an average grain roundness coefficient n in the range of from 2 to less than 15.
REFERENCES:
patent: 4539290 (1985-09-01), Mumaw
patent: 4865962 (1989-09-01), Hasebe et al.
patent: 5252454 (1993-10-01), Suzumoto et al.
patent: 5252456 (1993-10-01), Oshima et al.
patent: 5549879 (1996-08-01), Chow
patent: 5728516 (1998-03-01), Edwards et al.
patent: 5736310 (1998-04-01), Chen et al.
patent: 5750327 (1998-05-01), Chang et al.
patent: 5783373 (1998-07-01), Mydlarz et al.
patent: 5783378 (1998-07-01), Mydlarz et al.
patent: 5792601 (1998-08-01), Edwards et al.
Research Disclosure, vol. 389 Sep. 1996, Item 38957, I.
Research Disclosure, vol. 382, Feb. 1996, Item 38213.
Chang Y. Chea
Jagannathan Ramesh
Mehta Rajesh V.
Anderson Andrew J.
Eastman Kodak Company
Huff Mark F.
Thomas Carl O.
LandOfFree
Robust process for the preparation of high chloride emulsions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Robust process for the preparation of high chloride emulsions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Robust process for the preparation of high chloride emulsions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1175406