Rinsing system used in a photoresist coater with capability to a

Details Rinsing system used in a photoresist coater with capability to a Rinsing system used in a photoresist coater with capability to a

1998-11-03

1999-08-17

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134195, 134110, 210136, 210143, 210418, 2104161, B08B 308

Patent

active

059378760

ABSTRACT:
A rinsing system used in a photoresist coater to remove a brim portion of the formed photoresist layer on a substrate. The rinsing system has capability to avoid a reversed pressure effect. The rinsing system includes several distribution ducts, which are coupled to a solvent container. Each duct includes an one-way valve, an automatically-releasing-gas filter, and a pump with sequential couplings from the solvent container. The pump is used to transport solvent to the substrate to rinse the photoresist layer. The pump also induces the reversed pressure effect, which can be avoided by the automatically-releasing-gas filter, the one-way valve, and the solvent container. The one-way valve includes a spring to hold a ball-like stopper of the valve so that the reversed pressure effect is consumed by the spring force. The automatically-releasing-gas filter contains a gas and includes a releasing-gas valve to release the gas. The solvent container also contain a gas with a pressure of about one atmospheric pressure. The reversed pressure effect is reduced by the pressure induced by the gases.

REFERENCES:
patent: 3990953 (1976-11-01), Austin
patent: 4899767 (1990-02-01), McConnell
patent: 4919154 (1990-04-01), Engle
patent: 5377708 (1995-01-01), Bergman
patent: 5651379 (1997-07-01), Mohindra
patent: 5816502 (1998-10-01), Sperry
patent: 5887606 (1999-03-01), Tsou

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