Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-12-23
1999-10-12
Le, Hoa Van
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 11, 134 13, 430302, 430319, B08B 308, G03F 730
Patent
active
059649518
ABSTRACT:
A rinsing solution for lithography which comprises a homogeneous solution of a water-soluble organic solvent and water. The water-soluble organic solvent may be any water-miscible organic solvent that have been used as solvents or rinsing solutions for resists or anti-reflective coatings. Preferred examples of the water-soluble organic solvent are a mixture of propylene glycol monoethyl ether and propylene glycol monometyl ether acetate, a mixture of propylene glycol monomethyl ether and propylene glycol monometyl ether acetate, and ethyl lactate. This rinsing solution is useful for dissolving away or stripping away cured or non-cured unnecessary resists, anti-reflective coatings, etc. from substrates such as in integrated circuit elements, color filters, liquid crystal display elements, etc. or from a resist-applying apparatus.
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Igawa Akihiko
Yamamoto Kenji
Clariant International Ltd.
Hanf Scott E.
Le Hoa Van
Sayko Jr. Andrew F.
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