Rinsing solution

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 11, 134 13, 430302, 430319, B08B 308, G03F 730

Patent

active

059649518

ABSTRACT:
A rinsing solution for lithography which comprises a homogeneous solution of a water-soluble organic solvent and water. The water-soluble organic solvent may be any water-miscible organic solvent that have been used as solvents or rinsing solutions for resists or anti-reflective coatings. Preferred examples of the water-soluble organic solvent are a mixture of propylene glycol monoethyl ether and propylene glycol monometyl ether acetate, a mixture of propylene glycol monomethyl ether and propylene glycol monometyl ether acetate, and ethyl lactate. This rinsing solution is useful for dissolving away or stripping away cured or non-cured unnecessary resists, anti-reflective coatings, etc. from substrates such as in integrated circuit elements, color filters, liquid crystal display elements, etc. or from a resist-applying apparatus.

REFERENCES:
patent: 2751373 (1956-06-01), Unruth et al.
patent: 2811509 (1957-10-01), Smith et al.
patent: 3763086 (1973-10-01), Kalopissis et al.
patent: 3854946 (1974-12-01), Sayigh et al.
patent: 3980587 (1976-09-01), Sullivan
patent: 4416976 (1983-11-01), Shell
patent: 4550069 (1985-10-01), Pampalone
patent: 4592787 (1986-06-01), Johnson
patent: 4609614 (1986-09-01), Pampalone et al.
patent: 4765844 (1988-08-01), Merrem et al.
patent: 4786580 (1988-11-01), Hsieh et al.
patent: 4822723 (1989-04-01), Dhillon
patent: 4910122 (1990-03-01), Arnold et al.
patent: 4983490 (1991-01-01), Durham
patent: 5039594 (1991-08-01), Durham
patent: 5066561 (1991-11-01), Pampalone
patent: 5294680 (1994-03-01), Knors et al.
patent: 5529887 (1996-06-01), Horn et al.
Patent Abstracts of Japan, vol. 014, No. 084 (P-1007), Feb. 16, 1990, JP 01296246A (Dainippon Printing Co. Ltd.), Nov. 29, 1989, abstract.
Patent Abstracts of Japan, 43 E 1561, JP 06-69120 (Mitsubishi Electric Corp.), Aug. 20, 92, abstract.
Patent Abstracts of Japan, JP 07131096 (Toshiba Corp Denki Kogyo Co. Ltd.), May 19, 95, abstract.
Patent Abstracts of Japan, 161 P 1777,JP06-118656 (Japan Synthetic Rubber Co. Ltd.), Oct. 5, 92, abstract.
Patent Abstracts of Japan, 25 P 1792, JP 06-148896 (Tokyo Ohka Kogyo Co. Ltd.), Nov. 13, 92, abstract.
Patent Abstracts of Japan, JP 08-129056 (Ando Electric Co. Ltd.), May 21, 96, abstract.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Rinsing solution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rinsing solution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rinsing solution will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-648453

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.