Cleaning and liquid contact with solids – Apparatus – With spray or jet supplying and/or applying means
Reexamination Certificate
2011-03-29
2011-03-29
Kornakov, Michael (Department: 1714)
Cleaning and liquid contact with solids
Apparatus
With spray or jet supplying and/or applying means
C134S104100
Reexamination Certificate
active
07913706
ABSTRACT:
Tool for treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like. The invention provides an approach for rapid, efficient rinsing of wetted surface(s), and is particularly advantageous when used to rinse the lower surface of moveable barrier structures such as a barrier plate that overlies a workpiece being treated in such a manner to define a tapering flow channel over the workpiece. Rather than spray rinsing liquid onto the surface in a manner that generates undue splashing, droplet, or mist generation, the liquid is flowingly dispensed, preferably under laminar flow conditions, onto a surface that is in fluid communication with the surface to be rinsed. A smooth, uniform wetting and sheeting action results to accomplish rinsing with a significantly reduced risk of generating particle contamination.
REFERENCES:
patent: 3990462 (1976-11-01), Elftmann et al.
patent: 4544446 (1985-10-01), Cady
patent: 4609575 (1986-09-01), Burkman
patent: 4682615 (1987-07-01), Burkman et al.
patent: 4801335 (1989-01-01), Burkman et al.
patent: 4903717 (1990-02-01), Sumnitsch
patent: 5020323 (1991-06-01), Hürlimann
patent: 5246526 (1993-09-01), Yamaguchi et al.
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5472502 (1995-12-01), Batchelder
patent: 5513668 (1996-05-01), Sumnitsch
patent: 5571560 (1996-11-01), Lin
patent: 5688322 (1997-11-01), Motoda et al.
patent: 5765072 (1998-06-01), Ohtani et al.
patent: 5783025 (1998-07-01), Hwang et al.
patent: 5785068 (1998-07-01), Sasaki et al.
patent: 5873380 (1999-02-01), Kanno
patent: 5900059 (1999-05-01), Shimanuki et al.
patent: 5916366 (1999-06-01), Ueyama et al.
patent: 5927303 (1999-07-01), Miya et al.
patent: 6048409 (2000-04-01), Kanno et al.
patent: 6051371 (2000-04-01), Mita et al.
patent: 6065424 (2000-05-01), Shacham-Diamand et al.
patent: 6090205 (2000-07-01), Sakai et al.
patent: 6096233 (2000-08-01), Taniyama et al.
patent: 6129546 (2000-10-01), Sada
patent: 6149759 (2000-11-01), Guggenberger
patent: 6221781 (2001-04-01), Siefering et al.
patent: 6230722 (2001-05-01), Mitsumori et al.
patent: 6239038 (2001-05-01), Wen
patent: 6243966 (2001-06-01), Lubomirsky et al.
patent: 6247479 (2001-06-01), Taniyama et al.
patent: 6260562 (2001-07-01), Morinishi et al.
patent: 6273104 (2001-08-01), Shinbara et al.
patent: 6299804 (2001-10-01), Domodossola et al.
patent: 6332470 (2001-12-01), Fishkin et al.
patent: 6385863 (2002-05-01), Kruwinus
patent: 6398975 (2002-06-01), Mertens et al.
patent: 6431184 (2002-08-01), Taniyama
patent: 6435200 (2002-08-01), Langen
patent: 6473993 (2002-11-01), Yagi et al.
patent: 6491764 (2002-12-01), Mertens et al.
patent: 6494221 (2002-12-01), Sellmer et al.
patent: 6536454 (2003-03-01), Lindner
patent: 6589338 (2003-07-01), Nakamori et al.
patent: 6594847 (2003-07-01), Krusell et al.
patent: 6672318 (2004-01-01), Tsuchiya et al.
patent: 6688784 (2004-02-01), Templeton
patent: 6694224 (2004-02-01), Ramanan
patent: 6705331 (2004-03-01), Sato et al.
patent: 6737104 (2004-05-01), Suzuki et al.
patent: 6810888 (2004-11-01), Tsuchiya et al.
patent: 6826910 (2004-12-01), Easton
patent: 6834440 (2004-12-01), Lee
patent: 6874516 (2005-04-01), Matsuno et al.
patent: 6901938 (2005-06-01), Sato et al.
patent: 6913651 (2005-07-01), Ivanov et al.
patent: 7022193 (2006-04-01), Jeong et al.
patent: 7051743 (2006-05-01), Kim et al.
patent: 7089076 (2006-08-01), Geismar et al.
patent: 7171973 (2007-02-01), Orii et al.
patent: 7275553 (2007-10-01), Orii et al.
patent: 7306002 (2007-12-01), Kim et al.
patent: 7309847 (2007-12-01), Cao
patent: 7323080 (2008-01-01), Kim et al.
patent: 7332055 (2008-02-01), Orii et al.
patent: 7364625 (2008-04-01), Christenson et al.
patent: 7383843 (2008-06-01), Ravkin et al.
patent: 7387131 (2008-06-01), Kuroda et al.
patent: 7389783 (2008-06-01), Woods et al.
patent: 7390365 (2008-06-01), Itoh et al.
patent: 7404407 (2008-07-01), Orii et al.
patent: 7422641 (2008-09-01), Nakajima et al.
patent: 7476616 (2009-01-01), Christenson
patent: 7531039 (2009-05-01), Sato et al.
patent: 7543593 (2009-06-01), Orii et al.
patent: 7584760 (2009-09-01), Miya et al.
patent: 2002/0029788 (2002-03-01), Verhaverbeke et al.
patent: 2002/0063169 (2002-05-01), Verhaverbeke et al.
patent: 2002/0106269 (2002-08-01), Nishimura et al.
patent: 2003/0051366 (2003-03-01), Ise et al.
patent: 2003/0070695 (2003-04-01), Emami et al.
patent: 2003/0084925 (2003-05-01), Nakajima et al.
patent: 2003/0155325 (2003-08-01), Mansour et al.
patent: 2003/0170988 (2003-09-01), Izumi et al.
patent: 2003/0172955 (2003-09-01), Kuroda et al.
patent: 2003/0181040 (2003-09-01), Ivanov et al.
patent: 2003/0226577 (2003-12-01), Orll et al.
patent: 2004/0050491 (2004-03-01), Miya et al.
patent: 2004/0055707 (2004-03-01), Sato et al.
patent: 2004/0060190 (2004-04-01), Lee
patent: 2004/0062874 (2004-04-01), Kim et al.
patent: 2004/0079395 (2004-04-01), Kim et al.
patent: 2004/0079396 (2004-04-01), Jeong et al.
patent: 2004/0089328 (2004-05-01), Sato et al.
patent: 2004/0132318 (2004-07-01), Kim et al.
patent: 2004/0226655 (2004-11-01), Kajino et al.
patent: 2005/0244579 (2005-11-01), Matsuzawa et al.
patent: 2005/0263066 (2005-12-01), Lubomirsky et al.
patent: 2006/0128133 (2006-06-01), Christenson
patent: 2006/0219258 (2006-10-01), Gast
patent: 2006/0260647 (2006-11-01), Verhaverbeke et al.
patent: 2007/0012339 (2007-01-01), Fukuda et al.
patent: 2007/0022948 (2007-02-01), Rose et al.
patent: 2007/0105380 (2007-05-01), Orii et al.
patent: 2007/0158329 (2007-07-01), Cao
patent: 2007/0245954 (2007-10-01), Collins et al.
patent: 2008/0006303 (2008-01-01), Butterbaugh et al.
patent: 2008/0008834 (2008-01-01), Collins et al.
patent: 2008/0210278 (2008-09-01), Orii et al.
patent: 2008/0213076 (2008-09-01), Hanson et al.
patent: 2008/0271763 (2008-11-01), Collins et al.
patent: 2008/0283090 (2008-11-01), DeKraker et al.
patent: 2009/0038647 (2009-02-01), DeKraker et al.
patent: 2009/0280235 (2009-11-01), Lauerhaas et al.
patent: 1 204 139 (2002-05-01), None
patent: 1 335 412 (2003-08-01), None
patent: 1 708 252 (2006-10-01), None
patent: 63073626 (1988-04-01), None
patent: 8-139065 (1996-05-01), None
patent: 8139065 (1996-05-01), None
patent: 2000124181 (2000-04-01), None
patent: 2001267278 (2001-09-01), None
patent: 2002343711 (2002-11-01), None
patent: 2003109935 (2003-04-01), None
patent: 2004-031400 (2004-01-01), None
patent: 2004-153078 (2004-05-01), None
patent: 2004265912 (2004-09-01), None
patent: 2005235945 (2005-09-01), None
patent: WO 03/030228 (2003-04-01), None
patent: WO 2004/001828 (2003-12-01), None
patent: WO 2004/070807 (2004-08-01), None
patent: WO 2004/093166 (2004-10-01), None
patent: WO 2006/107549 (2006-10-01), None
patent: WO 2006/107550 (2006-10-01), None
patent: WO 2008/029848 (2008-03-01), None
Machine translation of 2004-031400.
Machine translation of 2004-153078.
Lim, Jung-Soo, “The 6th Surface Cleaning Users Group Meeting, Cleaning Technology Symposium,” handout, Sep. 19, 2007 (9 pages).
Adjustable Flow Air Amplifiers, http://www.airtxinternational.com/catalog/air—amplifiers.php?gclid=CMHsm—ix551CF QE . . . (3 pages).
Air Amplifier—Nex FIow™, http://www.process-controls.com/techsales/Nex—Flow/air—amplifier.htm (3 pages).
Collins Jimmy D.
DeKraker David
Gast Tracy A.
Rose Alan D.
Williamson Richard E.
Campbell Natasha
FSI International Inc.
Kagan Binder PLLC
Kornakov Michael
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