Rinsing method, developing method, developing system and...

Details Rinsing method, developing method, developing system and... Rinsing method, developing method, developing system and...

2006-10-30

2010-11-30

LaBalle, Clayton E (Department: 2862)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S611000, C430S432000, C430S434000, C134S033000, C427S240000

Reexamination Certificate

active

07841787

ABSTRACT:
The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step5), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step6), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step7).

REFERENCES:
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patent: 2008/0078426 (2008-04-01), Miya et al.
patent: 2008/0090185 (2008-04-01), Harumoto et al.
patent: 2008/0090186 (2008-04-01), Harumoto et al.
patent: 07-135136 (1995-05-01), None
patent: 2001-57334 (2001-02-01), None
patent: 2003-007595 (2003-01-01), None
Office Action issued Jul. 12, 2010, in Japanese Application No. 2005-326508, 9 pages, (with English translation).

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