Rinse water recycling in CMP apparatus

Abrading – Abrading process – Abradant supplying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

451 41, 451 54, 451287, 134902, B24B 5700

Patent

active

057556148

ABSTRACT:
Recycled slurry is continuously blended with the slurry in use to provide a consistent polishing rate while consuming or discarding a small fraction of the slurry flowing continuously across the polishing pad. The slurry is recovered in a catch ring and fed to a recycle loop to blend the recovered slurry with fresh slurry, rejuvenating chemicals, or water; test the blend; filter the blend; and return the blend to the polishing pad. The volume returned to the pad slightly exceeds the volume recovered, causing the catch ring to overflow. Rinse water is recycled in the same fashion to keep the polishing pad wet between polishing cycles.

REFERENCES:
patent: 3905162 (1975-09-01), Lawrence et al.
patent: 4059929 (1977-11-01), Bishop
patent: 5142828 (1992-09-01), Curry, II
patent: 5490809 (1996-02-01), Jones et al.
patent: 5545076 (1996-08-01), Yun et al.
patent: 5575705 (1996-11-01), Yam et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Rinse water recycling in CMP apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rinse water recycling in CMP apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rinse water recycling in CMP apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1954458

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.