Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Developing
Reexamination Certificate
2011-07-12
2011-07-12
Kelly, Cynthia H (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Post imaging processing
Developing
C430S331000
Reexamination Certificate
active
07977039
ABSTRACT:
In the present invention, in a rinse treatment method of cleaning a substrate after an exposed pattern thereon has been subjected to developing treatment, the following steps are performed such as supplying pure water onto the substrate to clean the substrate with the pure water; supplying a first rinse solution composed of a surfactant with a predetermined concentration onto the substrate to clean the substrate with the first rinse solution; and supplying a second rinse solution composed of a surfactant with a concentration lower than that of the first rinse solution onto the substrate to clean the substrate with the second rinse solution. According to the present invention, in the rinse treatment of the substrate after developing treatment, it is possible to dry the substrate without causing pattern collapse to restrain variation in pattern line width, and to reduce the remaining precipitation-based defects to increase the productivity.
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Kitano Junichi
Shimoaoki Takeshi
Eoff Anca
Kelly Cynthia H
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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