Rinse treatment method, developing treatment method and...

Details Rinse treatment method, developing treatment method and... Rinse treatment method, developing treatment method and...

2011-07-12

2011-07-12

Kelly, Cynthia H (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Post imaging processing

Developing

C430S331000

Reexamination Certificate

active

07977039

ABSTRACT:
In the present invention, in a rinse treatment method of cleaning a substrate after an exposed pattern thereon has been subjected to developing treatment, the following steps are performed such as supplying pure water onto the substrate to clean the substrate with the pure water; supplying a first rinse solution composed of a surfactant with a predetermined concentration onto the substrate to clean the substrate with the first rinse solution; and supplying a second rinse solution composed of a surfactant with a concentration lower than that of the first rinse solution onto the substrate to clean the substrate with the second rinse solution. According to the present invention, in the rinse treatment of the substrate after developing treatment, it is possible to dry the substrate without causing pattern collapse to restrain variation in pattern line width, and to reduce the remaining precipitation-based defects to increase the productivity.

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