Rinse method and developing apparatus

Details Rinse method and developing apparatus Rinse method and developing apparatus

2006-11-21

2011-10-04

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Processes

Combined

C134S026000, C134S042000, C134S137000, C134S153000

Reexamination Certificate

active

08029624

ABSTRACT:
A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.

REFERENCES:
patent: 5275667 (1994-01-01), Ganesan et al.
patent: 6062240 (2000-05-01), Sada et al.
patent: 2003/0045098 (2003-03-01), Verhaverbeke et al.
patent: 2003/0045131 (2003-03-01), Verbeke et al.
patent: 10-172951 (1998-06-01), None
patent: 2001-53051 (2001-02-01), None
patent: 2002-57093 (2002-02-01), None
patent: 2002-057093 (2002-02-01), None

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