Rinse/dry apparatus including a chamber with a moveable side wal

Details Rinse/dry apparatus including a chamber with a moveable side wal Rinse/dry apparatus including a chamber with a moveable side wal

1999-07-21

2000-08-01

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With non-impelling fluid deflector or baffle other than...

134 2, 134 3, 134 21, 134 254, 134 255, 134 26, 134 31, 134 952, 134902, 34 77, 34 78, 137395, 137426, 137574, B08B 300

Patent

active

060951672

ABSTRACT:
An apparatus for rinsing and drying semiconductor wafers. The apparatus includes side walls, end walls and a base. One embodiment of the apparatus includes a rigid side and end walls. In another embodiment of the apparatus, at least a portion of the side wall is collapsible. In yet another embodiment of the apparatus, at least a portion of the wall has a tambour configuration, facilitating bending or rolling of the wall beneath the base. The apparatus includes an assembly for injecting a rinse liquid into the chamber. The side walls, end walls, and base form a chamber configured to receive at least one semiconductor wafer. Rinse liquid can be directed into the chamber, over each semiconductor wafer therein to rinse each semiconductor wafer. At least a portion of a side wall can be lowered substantially vertically to permit rinse liquid to flow out of the chamber. The apparatus also includes an assembly for injecting a drying fluid into the chamber.

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