Ringfield lithographic camera

Details Ringfield lithographic camera Ringfield lithographic camera

1995-10-12

1998-09-08

Epps, Georgia Y.

Optical: systems and elements

Mirror

Plural mirrors or reflecting surfaces

378 34, G02B 510

Patent

active

058053654

ABSTRACT:
A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.

REFERENCES:
patent: 3748015 (1973-07-01), Offner
patent: 4226501 (1980-10-01), Shafer
patent: 4240707 (1980-12-01), Wetherell
patent: 4241390 (1980-12-01), Markle et al.
patent: 4733955 (1988-03-01), Cook
patent: 4737021 (1988-04-01), Korsch
patent: 4747678 (1988-05-01), Shafer
patent: 4804258 (1989-02-01), Kebo
patent: 5003567 (1991-03-01), Hawryluk
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5220590 (1993-06-01), Bruning
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5257139 (1993-10-01), Higuchi
patent: 5315629 (1994-05-01), Jewell
patent: 5353322 (1994-10-01), Bruning
patent: 5361292 (1994-11-01), Sweatt
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5524039 (1996-06-01), Kamon

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