Rheological fluids for particle removal

Details Rheological fluids for particle removal Rheological fluids for particle removal

2011-07-19

2011-07-19

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S004000, C134S010000, C134S042000, C252S06251C, C252S073000, C451S035000, C451S038000, C204S242000

Reexamination Certificate

active

07981221

ABSTRACT:
Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.

REFERENCES:
patent: 2417850 (1947-03-01), Winslow
patent: 3150678 (1964-09-01), Nuber
patent: 3197682 (1965-07-01), Martinek et al.
patent: 3309915 (1967-03-01), McEuen et al.
patent: 4033892 (1977-07-01), Stangroom
patent: 4129513 (1978-12-01), Stangroom
patent: 4687589 (1987-08-01), Block et al.
patent: 4864461 (1989-09-01), Kasahara
patent: 4999954 (1991-03-01), Miyamoto et al.
patent: 5032307 (1991-07-01), Carlson
patent: 5054593 (1991-10-01), Carlson
patent: 5213713 (1993-05-01), Reitz
patent: 5277281 (1994-01-01), Carlson et al.
patent: 5336426 (1994-08-01), Rader et al.
patent: 5374367 (1994-12-01), Edamura et al.
patent: 5382373 (1995-01-01), Carlson et al.
patent: 5449313 (1995-09-01), Kordonsky et al.
patent: 5496174 (1996-03-01), Garner
patent: 5496484 (1996-03-01), Shima et al.
patent: 5503763 (1996-04-01), Podszun et al.
patent: 5507967 (1996-04-01), Fujita et al.
patent: 5516445 (1996-05-01), Sasaki et al.
patent: 5523157 (1996-06-01), Sasaki et al.
patent: 5577948 (1996-11-01), Kordonsky et al.
patent: 5651834 (1997-07-01), Jon et al.
patent: 5702630 (1997-12-01), Sasaki et al.
patent: 5854962 (1998-12-01), Boockholdt et al.
patent: 5879582 (1999-03-01), Havelka et al.
patent: 5891356 (1999-04-01), Inoue et al.
patent: 5931721 (1999-08-01), Rose et al.
patent: 5971835 (1999-10-01), Kordonski et al.
patent: 5976264 (1999-11-01), McCullough et al.
patent: 6048405 (2000-04-01), Skrovan et al.
patent: 6220935 (2001-04-01), Furusawa et al.
patent: 6269511 (2001-08-01), Andreas et al.
patent: 6277306 (2001-08-01), Endo et al.
patent: 6277753 (2001-08-01), Mullee et al.
patent: 6280658 (2001-08-01), Atarashi et al.
patent: 6530217 (2003-03-01), Yokota et al.
patent: 6598465 (2003-07-01), Shin et al.
patent: 6647611 (2003-11-01), Zhang
patent: 6663719 (2003-12-01), Shinozaki et al.
patent: 6682660 (2004-01-01), Sucholeiki et al.
patent: 6776171 (2004-08-01), Carpenter et al.
patent: 6797202 (2004-09-01), Endo et al.
patent: 6818143 (2004-11-01), Iyengar
patent: 6852251 (2005-02-01), Sheng et al.
patent: 6984343 (2006-01-01), Wen et al.
patent: 7129573 (2006-10-01), Hiatt et al.
patent: 7135444 (2006-11-01), Yates et al.
patent: 7137496 (2006-11-01), Sheng et al.
patent: 7217372 (2007-05-01), Kintz et al.
patent: 7288075 (2007-10-01), Parihar et al.
patent: 2001/0037821 (2001-11-01), Staley et al.
patent: 2002/0079176 (2002-06-01), Anderson
patent: 2002/0153647 (2002-10-01), Baudendistel et al.
patent: 2003/0004075 (2003-01-01), Suto et al.
patent: 2003/0109394 (2003-06-01), Ruhr et al.
patent: 2003/0116176 (2003-06-01), Rothman et al.
patent: 2003/0143857 (2003-07-01), Andreas
patent: 2004/0232378 (2004-11-01), Suh et al.
patent: 2005/0017943 (2005-01-01), Weisbuch et al.
patent: 2005/0173377 (2005-08-01), Pietsch et al.
patent: 2005/0211525 (2005-09-01), Sheng et al.
patent: 2005/0255360 (2005-11-01), Post et al.
patent: 2006/0000495 (2006-01-01), Brown
patent: 2006/0063681 (2006-03-01), Christanti et al.
patent: 2006/0076040 (2006-04-01), Moore et al.
patent: 2006/0128600 (2006-06-01), Freer et al.
patent: 2006/0144286 (2006-07-01), Baum
patent: 2006/0248750 (2006-11-01), Rosenberg
patent: 2006/0252354 (2006-11-01), Arana et al.
patent: 2006/0272677 (2006-12-01), Lee et al.
patent: 2007/0000518 (2007-01-01), Korolik et al.
patent: 2007/0023247 (2007-02-01), Ulicny et al.
patent: 2007/0084483 (2007-04-01), Freer et al.
patent: 2007/0084485 (2007-04-01), Freer et al.
patent: 2008/0296530 (2008-12-01), Fuchs et al.
patent: 2009/0156452 (2009-06-01), Mui et al.
patent: 2009/0305868 (2009-12-01), Kutushov
patent: 2010/0043824 (2010-02-01), Greeley et al.
patent: 2010/0171065 (2010-07-01), Shen et al.
patent: 2010/0229890 (2010-09-01), Sabba et al.
patent: 1065708 (2001-01-01), None
patent: 1389496 (2004-02-01), None
patent: 9511956 (1993-10-01), None
Ricci, Anthony. ‘Removing Particulate Contamination in Ultra High Pure Gas Delivery Systems by Installing Pall Gas Filters’ 2005. Pall Corporation, New York.
National Industrial Competitiveness through Energy, Environment and Economics (NICE3). ‘SO3 Cleaning Process in Semiconductor Manufacturing’ Jan. 1999. Washington, DC.
Electrorheological Fluid, http://en.wikipeclia.org/wiki/Electrorheological—fluid; Jun. 25, 2007.
Magnetorheological Fluid, http://en.wikipedia.org/wiki/Magnetorheological—fluid; Feb. 12, 2008.
What is Magneto-Rheological (MR) Fluid?; http://www.lord.com/Home/MagnetoRheologicalMRFluid/MRFluidTechnology/WhatisMr/tabid/3772/; Feb. 12, 2008.
Department of Physics; Electrorheological (ER) fluids; http://web.phys.ust.hk/index.php? option=com—content&task=view&id=88&Itemid=79; Feb. 12, 2008.
Introduction to Electrorheology and Magnetorheology; http://homepages.cae.wisc.edu/—klingen/group/ermrintro.htm; Apr. 26, 2007.
What is Magnetorheological Fluid?; http://www.tech-faq.com/magnetorheological-fluid.shtml; Feb. 12, 2008.
Benjamin Craig; The AMPTIAC Quarterly, vol. 7, No. 2, pp. 15-19. 2003.
Dassanayake, et al.; Physical Review E., 69, 021507-1 to 021507-7, 2004.
Espin, et al.; J. Non-Newtonian Fluid Mech., 125, 1-10, 2005.
Guegan, et al., Chemical Physics, arxiv.org/pdf/physics/0607158, Jul. 2006.
Inoue, et al., Journal of Applied Science, vol. 55, 113-118 (1995).
Negita, et al., J. Phys. II France 5, pp. 883-892, Jun. 1995.
Jennifer Ouellette, The Industrial Physicist, pp. 14-17, Dec. 2003/Jan. 2004.
Park et al., Korea-Australia Rheology Journal, vol. 13, No. 1, pp. 13-17, Mar. 2001.
Radcliffe, et al., State Feedback Control of Electrorheological Fluids, 1996 ASME International Congress and Exhibition, Nov. 17-22, 1996, Atlanta Georgia, pp. 1-8.
Tse, et al., Macromolecules, 33, pp. 3134-3141, 2000.
Guangqiang Yang, Large-Scale Magnetorheological Fluid Damper for Vibration Mitigation: Modeling, Testing and Control, http://cee.uiuc.edu/sstl/gyang2/gyang2—thesis.htm; Apr. 9, 2008.
Ursescu, Ana, Techn. Univ., Darmstadt, Diss., pp. 13-15, 2005.
Choi, H.J., et al., IEEE Transactions on Magnetics, vol. 41, No. 10, 3448-3450, Oct. 2005.

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