RF plasma treated photosensitive lithographic printing plates

Details RF plasma treated photosensitive lithographic printing plates RF plasma treated photosensitive lithographic printing plates

1987-05-11

1988-10-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430158, 430165, 430167, 430276, 430278, 430302, 430525, 430526, G03C 194, G03C 152, G03C 168, G03C 174

Patent

active

047771097

ABSTRACT:
A metal base lithographic printing plate cleaned and treated by RF plasma to render the non-exposed area hydrophilic, then coated with either a negative working or positive working photosensitive coating. The method is characterized by its elimination of the conventional alkaline etch with attendant hazard, pollution and toxicity problems.

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