RF plasma source for cleaning spacecraft surfaces

Details RF plasma source for cleaning spacecraft surfaces RF plasma source for cleaning spacecraft surfaces

1997-05-15

1999-07-27

Breneman, Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723AN, 118723MA, 118715, C23F 102

Patent

active

059284617

ABSTRACT:
A plasma source uses radio frequency electromagnetic radiation to ionize and dissociate gas molecules into reactive species within a plasma generation tube and emits the species to react with and remove contaminants from surfaces on a spacecraft. The source of the radiation is an antenna brazed to the outside of the plasma generation tube. Permanent magnets ring the plasma generation tube within a metallic housing to generate a magnetic field. Pole pieces are provided to improve the strength of the field and to improve its uniformity and axial orientation within the plasma generation tube. A plenum and a gas diffusing element distribute gas entering the plasma generation tube.

REFERENCES:
patent: 5418431 (1995-05-01), Williamson et al.
patent: 5429070 (1995-07-01), Campbell et al.
patent: 5514936 (1996-05-01), Williamson et al.
patent: 5537004 (1996-07-01), Imahashi et al.
patent: 5628831 (1997-05-01), Williamson et al.
patent: 5696429 (1997-12-01), Williamson et al.
patent: 5824602 (1998-10-01), Molvik et al.
patent: 5858100 (1999-01-01), Maeda et al.

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