RF induction plasma source generating apparatus

Details RF induction plasma source generating apparatus RF induction plasma source generating apparatus

1998-12-04

2000-06-13

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723MP, 118733, 422186, 42218629, C23C 1600

Patent

active

060735783

ABSTRACT:
The object of the present invention is to provide a RF induction plasma source generating apparatus which generates a stabilized plasma and sustains the stabilized plasma by maintaining the plasma pressure from several hundreds Torr to several thousands Torr with attachment a buffer nozzle cap, upper metallic blocking films and lower metallic blocking films to a nozzle cap, plasma tube and RF induction coils, respectively for separating the plasma source generating apparatus from the chamber. To accomplish the object of the invention, the plasma source generating apparatus comprising PBN tube, RF induction coils, a nozzle, and a nozzle cap is characterized by a buffer nozzle cap for locating between the nozzle cap and the plasma tube and modulating the flow of the gas to modulate the difference between the chamber pressure and the plasma pressure; sealing films formed by sealing the lips of the buffer nozzle cap, the nozzle cap and the plasma tube for preventing the leakage of gas; and upper blocking films and lower blocking films for blocking the spread out of the RF electric field induced in the RF induction coils and converging the plasma source.

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