RF induction heating apparatus for floating-zone melting

Electric heating – Metal heating – Of cylinders

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Details

219 1043, 219 1079, 156604, 15662072, 15662073, 373139, H05B 640

Patent

active

049422790

ABSTRACT:
An RF induction heating apparatus for manufacturing single-crystal semiconductors having large diameters using the floating-zone melting process is provided in which a single turn induction heating coil suitable for zone melting and another heating coil suitable for controlling single-crystal growth are concentrically or eccentrically positioned to surround an outer surface of a floating zone in a crystalline semiconductor rod. Either the upper or lower peripheral edge of the outer surface of the single-turn induction heating coil is surrounded by and coupled to a annular collar, while both ends of the collar are arranged opposite each other across a gap. At least one conductive sector plate is affixed to a coil lower surface opposite a region of the semiconductor to be heated, so that even if both ends of the coil are spaced apart from each other due to the presence of a supply tube or the like, any gap between the two ends is shielded by the conductive sector plate(s).

REFERENCES:
patent: 3601569 (1971-08-01), Keller
patent: 3607138 (1971-09-01), Keller
patent: 3725630 (1973-04-01), Gagliardi
patent: 3827017 (1974-07-01), Keller
patent: 4110586 (1978-08-01), Kohl et al.
patent: 4220839 (1980-09-01), De Leon
patent: 4538279 (1985-08-01), Keller
patent: 4797525 (1989-01-01), Keller

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