RF delivery configuration in a plasma processing system

Wave transmission lines and networks – Plural channel systems – Having branched circuits

Reexamination Certificate

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C333S017300, C333S033000

Reexamination Certificate

active

07042311

ABSTRACT:
In one embodiment, a system for delivering radio frequency (RF) power to a plasma processing system includes an automatic impedance matching network configured to receive RF power from an RF generator, and a fixed impedance matching network coupled between the automatic impedance matching network and the plasma processing chamber. The fixed impedance matching network may be configured to transform a first impedance presented by the chamber to a second impedance that allows the automatic impedance matching network to operate within a tuning range.

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