Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1984-04-02
1985-04-23
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156643, 156646, 204298, B44C 122, C03C 1500, C03C 2506
Patent
active
045128413
ABSTRACT:
An improved reactive ion plasma etching apparatus having an improved electrode, for holding the product, such as a semiconductor wafer, to be etched, provided with a plurality of apertures into which different tailored product holders are inserted so as to alter the plasma over each holder and provide more uniform etching of the product in the holder regardless of its position on the electrode.
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IBM Technical Disclosure Bulletin, vol. 13, #5, Oct. 1970, p. 1296, Y. Budo et al.
Cunningham, Jr. George F.
Lewis John W.
McClure Robert B.
Poindexter Daniel J.
International Business Machines - Corporation
Powell William A.
Thornton Francis J.
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