Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent
1998-06-23
2000-11-21
Utech, Benjamin L.
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
438745, 438754, C23F 100
Patent
active
061502790
ABSTRACT:
A method and apparatus for gold etching in semiconductor circuit manufacturing. An environmentally safe etching solution is used in an electroplating device to etch gold from a semiconductor substrate. The etching solution is free of iodine and cyanide based compounds and preferably includes thiourea.
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Perez-Ramos Vanessa
Utech Benjamin L.
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