Reusable electrical overlay measurement circuit and process

Details Reusable electrical overlay measurement circuit and process Reusable electrical overlay measurement circuit and process

1981-12-07

1984-03-20

Hayes, Monroe H.

Photocopying

Miscellaneous

355 77, 355 53, G03B 2732, G03B 2742

Patent

active

044377606

ABSTRACT:
A reusable electric overlay measurement base pattern includes a pair of current pads forming first and second pads adapted to be contacted by point contacts, a first conductor of controlled width extending between the first and second pads, a pair of voltage pads forming third and fourth pads suitable for contacting by point contacts, two second conductors extending from the third and fourth pads to the first conductor contacting the first conductor at a predetermined spacing, and a fifth pad disposed adjacent and spaced from said first conductor approximately at the midpoint between the two second conductors. This permits a second level conductor to be deposited extending between the fifth pad and said first conductor which, when perfectly aligned, will intersect the first conductor at its midpoint. The misalignment of the second level conductor can be detected by measurements using the five pads. All of the four pads which are interconnected, along with the fifth pad are made of a conductive material which is resistant to an etchant which can be used in conjunction with the second level conductive layer which is of a different conductive material to remove the second metal layer after use thereby permitting reuse of the first layer.

REFERENCES:
patent: 3743417 (1973-07-01), Smatlak
patent: 3771872 (1973-11-01), Nightingale et al.
patent: 3873203 (1975-03-01), Stevenson
patent: 3914050 (1975-10-01), Dost et al.
patent: 4286871 (1981-09-01), Erickson
IEEE Transactions on Electron Devices, vol. ED-26 No. 4 Apr., 1979 pp. 729-732.
Journal of Electrochemical Society: Solid-State Science and Technology, Apr., 1978 pp. 650-654.
IEEE Journal of Solid-State Circuits, vol. SC-13 Aug., 1978 pp. 436-444.
SPIE vol. 334 Optical Microlithography-Technology for the Mid-1980's (1982) pp. 2-16.
Technical Digest 1977 International Electron Devices Meeting Dec. 5-7 (1977) pp. 7A-7F.

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